| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which ensures good resolution of a pattern obtained. <P>SOLUTION: The resist composition comprises: a resin comprising a structural unit derived from a monomer containing a phenolic hydroxyl group; an acid generator represented by formula (I); and at least one compound selected from the group consisting of compounds represented by formula (II) and compounds represented by formula (III), wherein Q<SP>1</SP>and Q<SP>2</SP>represent a fluorine atom or 1-6C perfluoroalkyl; X<SP>1</SP>represents a 1-6C saturated hydrocarbon group, provided that hydrogen atoms contained in the saturated hydrocarbon group may be substituted by hydroxyl groups and that -CH<SB>2</SB>- contained in the saturated hydrocarbon group may be substituted by -O- or -CO-; Z<SP>+</SP>represents an organic counter cation; R<SP>1</SP>to R<SP>3</SP>each independently represent 1-6C alkylene; and R<SP>4</SP>to R<SP>7</SP>each independently represent 1-6C alkyl, provided that hydrogen atoms contained in the alkyl may be substituted by hydroxyl groups. <P>COPYRIGHT: (C)2011,JPO&INPIT |
