发明名称 POLYGLYCOLIC ACID-BASED RESIN, PROCESS FOR PRODUCING THE SAME AND APPLICATION THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a high-molecular weight polyglycolic acid-based resin having an amide linkage excellent in heat stability in the molecular chain, a process for producing the same, and its application. <P>SOLUTION: The polyglycolic acid-based resin having a constituting unit represented by formula (1) (wherein R is a polyisocyanate residue and a 1-20C aliphatic hydrocarbon group, a 3-20C hydrocarbon group including an alicyclic structure or a 6-20C hydrocarbon group including an aromatic ring) is obtained by reacting a glycolic acid oligomer having a content of a carboxyl group in the terminal functional group of more than 90% with a polyisocyanate compound. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011052110(A) 申请公布日期 2011.03.17
申请号 JP20090202025 申请日期 2009.09.01
申请人 MITSUI CHEMICALS INC 发明人 OGAWA RYOHEI;HORI HIDESHI;USUGI SHINICHI
分类号 C08G64/42;C08G18/42 主分类号 C08G64/42
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