| 摘要 |
<p>PURPOSE: A shutter unit, a lithographic apparatus, and method for manufacturing a device are provided to maintain the accuracy of a positioning system by preventing the escape of immersion liquid from an immersion space. CONSTITUTION: A substrate table is prepared. A fluid handling structure(12) is prepared by forming a space between a projection system(PS) and either of the substrate table or a substrate(W), or both of the substrate table and the substrate. A swap table is arranged under the fluid handling structure in order to maintain liquid in the space. A transferring surface is arranged under the fluid handling structure, on the surface of the substrate table, and on the surface of the swap table. The transferring surface prevents the movement of immersion liquid.</p> |
