发明名称 ACTIVE PHASE CORRECTION METHOD USING THE NEGATIVE INDEX META MATERIALS, EXPOSURE IMAGING DEVICE AND SYSTEM USING THE SAME AND METHOD TO IMPROVE RESOLUTION OF EXPOSURE IMAGING DEVICE USING THE NEGATIVE INDEX META MATERIALS
摘要 <p>PURPOSE: An active phase correction method using a negative refractive index meta material, exposure imagine device and system using the same, and a method for improving the resolution of the exposure imaging device are provided to correct an image spreading phenomenon due to electromagnetic wave. CONSTITUTION: An optical transparent material layer does not absorb electromagnetic wave in an incident wavelength band. A photo-mask layer is composed of an optical opaque material and patterns containing information related to an exposure target and a circuit array. A first positive refractive index material layer separates the photo mask layer and a negative refractive index meta-material layer. A second positive refractive index material layer separates the negative refractive index meta-material layer and a recording layer. A lens stack layer is composed of the positive refractive index material layers and negative refractive index meta-material layer. The recording layer is composed of a photo-sensitive material.</p>
申请公布号 KR20110027543(A) 申请公布日期 2011.03.16
申请号 KR20100054817 申请日期 2010.06.10
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY 发明人 KIM, KYOUNG SIK;PARK, HAE SUNG;LEE, KWANG CHIL
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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