发明名称 Floating-type substrate conveying and processing apparatus
摘要 The present invention provides a floating-type substrate conveying and processing apparatus that floats a substrate to be processed. The device includes a floating stage that floats the substrate, a liquid supplier placed above the floating stage via the substrate to supply a process liquid to a surface of the substrate, and a moving mechanism for holding the substrate as detachable at opposite ends of the substrate, at a floating height of the substrate, and for moving the substrate on the floating stage. The floating stage is formed of a porous member and has a plurality of suction apertures airtightly defined in a porous portion of the porous member. The floating stage injects gas through the porous portion and sucks gas through the suction apertures to float the substrate placed on the porous portion.
申请公布号 US7905195(B2) 申请公布日期 2011.03.15
申请号 US20060486005 申请日期 2006.07.14
申请人 TOKYO ELECTRON LIMITED 发明人 YAMASAKI TSUYOSHI;INAMASU TOSHIFUMI;SHINOZAKI KENYA;MOTODA KIMIO
分类号 B05C5/02 主分类号 B05C5/02
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