发明名称 Method for conditioning a process chamber
摘要 A method of conditioning a processing chamber for a production process includes performing a conditioning step at a conditioning process recipe substantially different than a process recipe of the production process, and performing a warm-up process at a warm-up process recipe substantially the same as the process recipe of the production process. The method can be performed after a wet-cleaning process has been performed. The conditioning procedure can allow the maintenance time to be decreased and can cause the etched features to be more accurate.
申请公布号 US7906032(B2) 申请公布日期 2011.03.15
申请号 US20060393674 申请日期 2006.03.31
申请人 TOKYO ELECTRON LIMITED 发明人 YAMASHITA ASAO
分类号 H01L21/00;C23C14/00;C23C16/00 主分类号 H01L21/00
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