发明名称 |
Semiconductor device having reduced thermal interface material (TIM) degradation and method therefor |
摘要 |
A semiconductor device has a substrate having a top and bottom surface and a plurality of metal layers. A first die is electrically coupled to the top surface of the substrate. A lid member is attached to a top surface of the die and to the top surface of the substrate. A layering is formed on portions of a top surface of the lid member. The layering will have a different coefficient of thermal expansion (CTE) than the lid member.
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申请公布号 |
US7906845(B1) |
申请公布日期 |
2011.03.15 |
申请号 |
US20080108419 |
申请日期 |
2008.04.23 |
申请人 |
AMKOR TECHNOLOGY, INC. |
发明人 |
GALLOWAY JESSE E.;KANUPARTHI SASANKA LAXMI NARASIMHA |
分类号 |
H01L23/10;H01L23/34 |
主分类号 |
H01L23/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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