发明名称 X-RAY ANALYSIS APPARATUS AND X-RAY ANALYSIS METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an X-ray analysis apparatus capable of working with efficiency and safely measuring a sample, and to provide a method for the apparatus. <P>SOLUTION: The X-ray analysis apparatus includes a radiation source for having an irradiation point on a sample irradiated with radiation; an X-ray detector for detecting characteristics and scattered X-rays emitted from the sample and outputting a signal containing energy information having the characteristic X-rays and scattered X-rays; an analyzer for analyzing the signal; a sample stage for mounting the sample; a movement mechanism for enabling relative movement of the sample on the sample stage, the radiation source and the X-ray detector; a measurement mechanism enabling the height of the irradiation point on the sample; and a controller for controlling the movement mechanism, based on the height of the irradiation point on the sample measured and adjusting the distances between the sample, the irradiation source and the X-ray detector. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011047898(A) 申请公布日期 2011.03.10
申请号 JP20090198718 申请日期 2009.08.28
申请人 SII NANOTECHNOLOGY INC 发明人 TAKAHARA TOSHIYUKI
分类号 G01N23/223 主分类号 G01N23/223
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