| 摘要 |
A semiconductor device comprises a capacitor in which a lower electrode, an adhesive layer, a capacitance insulating film, and an upper electrode are provided in series. The capacitance insulating film has laminated films in which a first metal oxide film and a second metal oxide film are alternatively laminated so that the first metal oxide film contacts with the adhesive layer. The adhesive layer has thickness of 0.3 nm or more and is an oxide film including at least one element selected from element contained in the lower electrode.
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