发明名称 OXIDE SEMICONDUCTOR, THIN FILM TRANSISTOR, AND DISPLAY DEVICE
摘要 <p>Disclosed are: an oxide semiconductor which enables the production of a thin film transistor having excellent electrical properties and excellent reliability; a thin film transistor provided with a channel layer formed using the oxide semiconductor; and a display device provided with the thin film transistor. The oxide semiconductor can be used for a thin film transistor, and contains Si, In, Zn and O as the constituent atoms.</p>
申请公布号 WO2011027591(A1) 申请公布日期 2011.03.10
申请号 WO2010JP57777 申请日期 2010.05.06
申请人 SHARP KABUSHIKI KAISHA;CHIKAMA YOSHIMASA;NISHIKI HIROHIKO;OHTA YOSHIFUMI;MIZUNO YUUJI;HARA TAKESHI;NAKAGAWA OKIFUMI;AITA TETSUYA;SUZUKI MASAHIKO;TAKEI MICHIKO;HARUMOTO YOSHIYUKI;NAKAGAWA KAZUO 发明人 CHIKAMA YOSHIMASA;NISHIKI HIROHIKO;OHTA YOSHIFUMI;MIZUNO YUUJI;HARA TAKESHI;NAKAGAWA OKIFUMI;AITA TETSUYA;SUZUKI MASAHIKO;TAKEI MICHIKO;HARUMOTO YOSHIYUKI;NAKAGAWA KAZUO
分类号 H01L29/786;G02F1/1368;G09F9/30 主分类号 H01L29/786
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