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发明名称
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS, PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION CHAMBER AND GAS DISTRIBUTION SHOWERHEAD ASSEMBLY
摘要
申请公布号
KR101019766(B1)
申请公布日期
2011.03.08
申请号
KR20050087454
申请日期
2005.09.20
申请人
发明人
分类号
H05H1/34;H05H1/30
主分类号
H05H1/34
代理机构
代理人
主权项
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