发明名称 Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition
摘要 A radiation-sensitive composition (and method of fabricating a device using the composition) includes a nonpolymeric silsesquioxane including at least one acid labile moiety, a polymer including at least one member selected from the group consisting of an aqueous base soluble moiety and an acid labile moiety, and a radiation-sensitive acid generator. Another radiation-senstive composition (and method of fabricating a device using the composition) includes a nonpolymerc silsesquioxane including at least one aqueous base soluble moiety, a polymer including an aqueous base soluble moiety, a crosslinker, and a radiation-sensitive acid generator.
申请公布号 US7901864(B2) 申请公布日期 2011.03.08
申请号 US20040948826 申请日期 2004.09.23
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 HUANG WU-SONG;ANGELOPOULOS MARIE;BRUNNER TIMOTHY A.;PFEIFFER DIRK;SOORIYAKUMARAN RATNAM
分类号 G03C1/00;G03F1/00;H01L21/00 主分类号 G03C1/00
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