发明名称 |
Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition |
摘要 |
A radiation-sensitive composition (and method of fabricating a device using the composition) includes a nonpolymeric silsesquioxane including at least one acid labile moiety, a polymer including at least one member selected from the group consisting of an aqueous base soluble moiety and an acid labile moiety, and a radiation-sensitive acid generator. Another radiation-senstive composition (and method of fabricating a device using the composition) includes a nonpolymerc silsesquioxane including at least one aqueous base soluble moiety, a polymer including an aqueous base soluble moiety, a crosslinker, and a radiation-sensitive acid generator.
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申请公布号 |
US7901864(B2) |
申请公布日期 |
2011.03.08 |
申请号 |
US20040948826 |
申请日期 |
2004.09.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
HUANG WU-SONG;ANGELOPOULOS MARIE;BRUNNER TIMOTHY A.;PFEIFFER DIRK;SOORIYAKUMARAN RATNAM |
分类号 |
G03C1/00;G03F1/00;H01L21/00 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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