发明名称 Nitride semiconductor light-emitting device
摘要 A nitride semiconductor light-emitting device wherein a substrate or nitride semiconductor layer has a defect concentration region and a low defect density region other than the defect concentration region. A portion including the defect concentration region of the nitride semiconductor layer or substrate has a trench region deeper than the low defect density region. Thus by digging the trench in the defect concentration region, the growth detection is uniformized, and the surface planarity is improved. The uniformity of the characteristic in the wafer surface leads to improvement of the yield.
申请公布号 US7903707(B2) 申请公布日期 2011.03.08
申请号 US20040554991 申请日期 2004.05.27
申请人 SHARP KABUSHIKI KAISHA;SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 KAMIKAWA TAKESHI;KANEKO YOSHIKA;MOTOKI KENSAKU
分类号 H01S5/00;H01S5/343;H01L21/205;H01S5/323 主分类号 H01S5/00
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