| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an acid generator comprising a new compound, a resist composition containing the acid generator, and to provide a method for forming a resist pattern that uses the resist composition. <P>SOLUTION: The resist composition contains a base material in which the solubility with respect to alkaline developer changes through the action of an acid, and a photoacid generator. The photoacid generator comprises a compound represented by formula (b1-1), and in the formula, Y<SP>10</SP>is a cyclic hydrocarbon group whose number of carbons is 5 or more and represents an acid-dissociable group; R<SP>6</SP>and R<SP>7</SP>are each a hydrogen atom, an alkyl group or an aryl group which may combine together, to form a ring; Y<SP>11</SP>and Y<SP>12</SP>are each an alkyl group or an aryl group which may combine together, to form a ring; and X<SP>-</SP>is an anion. <P>COPYRIGHT: (C)2011,JPO&INPIT |
