| 发明名称 |
CYCLIC COMPOUND, MANUFACTURING METHOD THEREFOR, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING A RESIST PATTERN |
| 摘要 |
<p>Provided is the cyclic compound represented by formula (1). (In the formula, L, R1, R', and m are as defined in the specification.) The cyclic compound represented by formula (1) dissolves well in a safe solvent, is highly sensitive, and produces a good resist pattern shape. Said compound is thus useful as a component of a radiation-sensitive composition.</p> |
| 申请公布号 |
WO2011024967(A1) |
申请公布日期 |
2011.03.03 |
| 申请号 |
WO2010JP64632 |
申请日期 |
2010.08.27 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC.;ECHIGO, MASATOSHI;HAYASHI, HIROMI |
发明人 |
ECHIGO, MASATOSHI;HAYASHI, HIROMI |
| 分类号 |
C08G8/32;G03F7/004;G03F7/038;H01L21/027 |
主分类号 |
C08G8/32 |
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