OBJECT PROCESSING DEVICE, EXPOSURE DEVICE, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an object processing device capable of exposing a substrate P with high accuracy and simplifying the configuration of a substrate stage device PST, and to provide an exposure device, an exposure method, and a method for manufacturing a device.

SOLUTION: A plurality of air floating units 50 jetting air to the lower face of the substrate P are arranged below the substrate P, and the substrate P is supported in contactless state so as to be almost horizontal. An exposed portion of the substrate P is held in contactless state from below by a fixed point stage 40 to make a pinpoint adjustment of the surface position of the exposed portion.

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