发明名称 Photosensitive Compound and Photosensitive Composition Including the Same
摘要 Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.
申请公布号 US2011053084(A1) 申请公布日期 2011.03.03
申请号 US20090649863 申请日期 2009.12.30
申请人 KOREA KUMHO PETROCHEMICAL CO., LTD 发明人 PARK JOO HYEON;KANG SEOK CHAN;CHO JUNG HWAN;SON KYUNG CHUL
分类号 G03F7/004;C07C245/12 主分类号 G03F7/004
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