发明名称 |
Photosensitive Compound and Photosensitive Composition Including the Same |
摘要 |
Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule. |
申请公布号 |
US2011053084(A1) |
申请公布日期 |
2011.03.03 |
申请号 |
US20090649863 |
申请日期 |
2009.12.30 |
申请人 |
KOREA KUMHO PETROCHEMICAL CO., LTD |
发明人 |
PARK JOO HYEON;KANG SEOK CHAN;CHO JUNG HWAN;SON KYUNG CHUL |
分类号 |
G03F7/004;C07C245/12 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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