| 摘要 |
<p>Disclosed is an exposure apparatus which exposes a substrate. The exposure apparatus is provided with: a stage which has a placing section having the substrate placed thereon and moves; a detection unit, which is provided on the stage, and detects the substrate portion at a position in a predetermined region of the placing section; and a control unit which drive-controls the stage, on the basis of the detection results obtained from the detection unit.</p> |
