发明名称 |
SYSTEM FOR NON RADIAL TEMPERATURE CONTROL FOR ROTATING SUBSTRATES |
摘要 |
Embodiments of the present invention provide apparatus and method for reducing non uniformity during thermal processing. One embodiment provides an apparatus for processing a substrate comprising a chamber body defining a processing volume, a substrate support disposed in the processing volume, wherein the substrate support is configured to rotate the substrate, a sensor assembly configured to measure temperature of the substrate at a plurality of locations, and one or more pulse heating elements configured to provide pulsed energy towards the processing volume. |
申请公布号 |
EP2289095(A2) |
申请公布日期 |
2011.03.02 |
申请号 |
EP20090739939 |
申请日期 |
2009.05.01 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ADERHOLD, WOLFGANG, R.;HUNTER, AARON;RANISH, JOSEPH, R. |
分类号 |
H01L21/324;H01L21/67 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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