发明名称 |
Photosensitive compound, photosensitive composition including the same, method of manufacturing the same |
摘要 |
Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule. |
申请公布号 |
EP2289874(A1) |
申请公布日期 |
2011.03.02 |
申请号 |
EP20100000224 |
申请日期 |
2010.01.12 |
申请人 |
KOREA KUMHO PETROCHEMICAL CO., LTD. |
发明人 |
PARK, JOO HYEON;KANG, SEOK CHAN;CHO, JUNG HWAN;SON, KYUNG SHUL |
分类号 |
C07C303/28;C07C309/76;G03F7/022 |
主分类号 |
C07C303/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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