发明名称 Photosensitive compound, photosensitive composition including the same, method of manufacturing the same
摘要 Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.
申请公布号 EP2289874(A1) 申请公布日期 2011.03.02
申请号 EP20100000224 申请日期 2010.01.12
申请人 KOREA KUMHO PETROCHEMICAL CO., LTD. 发明人 PARK, JOO HYEON;KANG, SEOK CHAN;CHO, JUNG HWAN;SON, KYUNG SHUL
分类号 C07C303/28;C07C309/76;G03F7/022 主分类号 C07C303/28
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