ETCHING SOLUTION COMPOSITION FOR FORMATION OF METAL LINE

摘要

PURPOSE: An etching solution composition is provided to improve productivity of etching process and to ensure quick etching speed without damage to equipment. CONSTITUTION: An etching solution composition contains 1-20 weight% of H_2O_2; 1-15 weight% of compound in which nitrate ion is dissolved; 1-5 weight% of persulfated salt compound, 0.01-5 weight% of cyclic amine compound; and remaining amount of water. The compound in which nitrate ion is dissolved is one or more selected from the group consisting of ammonium nitrate, sodium nitrate, potassium nitrate, and nitric acid.