发明名称 RESIST LIQUID SUPPLY APPARATUS, RESIST LIQUID SUPPLY METHOD, AND COMPUTER-READABLE STORAGE MEDIUM
摘要 PURPOSE: An apparatus for supplying resist liquid is provided to reduce default of a resist pattern and foreign materials such as resist gel. CONSTITUTION: An apparatus(200) for supplying resist liquid comprises: a resist liquid supply source(201) which flows under resist liquid; a supply tube(202) for supplying the resist liquid with a coating nozzle(142); a filter(207) for removing foreign materials from the resist liquid; and a heater(205) for heating the resist liquid inside the supply tube at certain temperature higher than room temperature. The resist liquid contains fluorine resins.
申请公布号 KR20110019711(A) 申请公布日期 2011.02.28
申请号 KR20100080114 申请日期 2010.08.19
申请人 TOKYO ELECTRON LIMITED 发明人 YOSHIHARA KOSUKE;YAMAMOTO YUSUKE
分类号 G03F7/16 主分类号 G03F7/16
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