发明名称 |
RESIST LIQUID SUPPLY APPARATUS, RESIST LIQUID SUPPLY METHOD, AND COMPUTER-READABLE STORAGE MEDIUM |
摘要 |
PURPOSE: An apparatus for supplying resist liquid is provided to reduce default of a resist pattern and foreign materials such as resist gel. CONSTITUTION: An apparatus(200) for supplying resist liquid comprises: a resist liquid supply source(201) which flows under resist liquid; a supply tube(202) for supplying the resist liquid with a coating nozzle(142); a filter(207) for removing foreign materials from the resist liquid; and a heater(205) for heating the resist liquid inside the supply tube at certain temperature higher than room temperature. The resist liquid contains fluorine resins.
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申请公布号 |
KR20110019711(A) |
申请公布日期 |
2011.02.28 |
申请号 |
KR20100080114 |
申请日期 |
2010.08.19 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
YOSHIHARA KOSUKE;YAMAMOTO YUSUKE |
分类号 |
G03F7/16 |
主分类号 |
G03F7/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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