| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a light shielding apparatus, a lighting optical system, and an exposure apparatus that can precisely project a predetermined pattern on a surface to be irradiated for exposure, and a method of manufacturing a device. <P>SOLUTION: The light shielding apparatus 25 which is provided to the lighting optical system illuminating a reticle based upon luminous flux emitted from a light source apparatus, and cuts off part of the luminous flux includes a light shielding portion 31 provided to be disposed in the optical path of the luminous flux and defining an outline shape of the luminous flux in a slit shape, the light shielding portion 31 including cavities 36a, 37a capable of transmitting the luminous flux and partition portions 36b, 37b provided adjacently to the cavities 36a, 37a to cut off the luminous flux. <P>COPYRIGHT: (C)2011,JPO&INPIT |
