| 发明名称 |
(Meth)acrylate compound, photosensitive polymer, and resist composition |
| 摘要 |
Disclosed are a (meth)acrylate compound, a photosensitive polymer, and a resist composition, and the (meth)acrylate compound includes a lactone-group-containing (meth)acrylate compound represented by the following Chemical Formula 1.
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| 申请公布号 |
US2011045405(A1) |
申请公布日期 |
2011.02.24 |
| 申请号 |
US20100805726 |
申请日期 |
2010.08.17 |
| 申请人 |
LEE SUNG-JAE;KIM TAE-HO;KIM JUN-SUK;LEE JIN-YOUNG;RYU KANG;CHOI SANG-JUN |
发明人 |
LEE SUNG-JAE;KIM TAE-HO;KIM JUN-SUK;LEE JIN-YOUNG;RYU KANG;CHOI SANG-JUN |
| 分类号 |
G03F7/004;C07D307/93;C07D495/04;C08F24/00;C08F28/06 |
主分类号 |
G03F7/004 |
| 代理机构 |
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