| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt for an acid-generating agent of a resist composition which can form patterns having excellent resolution, focus margin (DOF) and line edge roughness (LER). <P>SOLUTION: The salt containing a divalent group represented by formula (a) [wherein, X<SP>a</SP>and X<SP>b</SP>are each independently O or S; R<SP>a</SP>, R<SP>b</SP>, R<SP>c</SP>and R<SP>d</SP>are each independently H, 1C-4C alkyl or 1C-4C alkoxy; (m) is 1 or 2; * is a bonding hand]. <P>COPYRIGHT: (C)2011,JPO&INPIT |
