发明名称 THIN FILM TRANSISTOR
摘要 <p>Disclosed is a thin film transistor in which a metal silicon compound thin film is used as a channel region. Specifically disclosed is a thin film transistor which is characterized in that a metal silicon compound thin film that is composed of a compound of a transition metal and silicon is used as a channel region, said compound of a transition metal and silicon containing, as a unit structure, a transition metal-containing silicon cluster in which the transition metal is surrounded by 7-16 silicon atoms and silicon atoms are located as the first and second nearest neighboring atoms of the transition metal.</p>
申请公布号 WO2011021669(A1) 申请公布日期 2011.02.24
申请号 WO2010JP64021 申请日期 2010.08.19
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY;UCHIDA NORIYUKI;KANAYAMA TOSHIHIKO;MIYAZAKI TAKEHIDE 发明人 UCHIDA NORIYUKI;KANAYAMA TOSHIHIKO;MIYAZAKI TAKEHIDE
分类号 H01L29/786;C01B33/06;C23C14/06;H01L21/205 主分类号 H01L29/786
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