发明名称 |
THIN FILM TRANSISTOR |
摘要 |
<p>Disclosed is a thin film transistor in which a metal silicon compound thin film is used as a channel region. Specifically disclosed is a thin film transistor which is characterized in that a metal silicon compound thin film that is composed of a compound of a transition metal and silicon is used as a channel region, said compound of a transition metal and silicon containing, as a unit structure, a transition metal-containing silicon cluster in which the transition metal is surrounded by 7-16 silicon atoms and silicon atoms are located as the first and second nearest neighboring atoms of the transition metal.</p> |
申请公布号 |
WO2011021669(A1) |
申请公布日期 |
2011.02.24 |
申请号 |
WO2010JP64021 |
申请日期 |
2010.08.19 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY;UCHIDA NORIYUKI;KANAYAMA TOSHIHIKO;MIYAZAKI TAKEHIDE |
发明人 |
UCHIDA NORIYUKI;KANAYAMA TOSHIHIKO;MIYAZAKI TAKEHIDE |
分类号 |
H01L29/786;C01B33/06;C23C14/06;H01L21/205 |
主分类号 |
H01L29/786 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|