发明名称 |
EUV projection lens and optic system having the same |
摘要 |
An EUV projection lens includes a substrate and concentric diffraction patterns on the substrate. The concentric diffraction patterns have an out-of phase height with respect to EUV light and include a material through which the EUV light has a transmittance higher than about 50% at the out-of phase height. The EUV projection lens has a high first order diffraction light efficiency and an optic system having the EUV projection lens has a high resolution.
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申请公布号 |
US2011042587(A1) |
申请公布日期 |
2011.02.24 |
申请号 |
US20100805003 |
申请日期 |
2010.07.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE DONG-GUN;KIM SEONG-SUE;SEO HWAN-SEOK |
分类号 |
G21K5/10;G02B5/18;G02B13/14 |
主分类号 |
G21K5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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