发明名称 EUV projection lens and optic system having the same
摘要 An EUV projection lens includes a substrate and concentric diffraction patterns on the substrate. The concentric diffraction patterns have an out-of phase height with respect to EUV light and include a material through which the EUV light has a transmittance higher than about 50% at the out-of phase height. The EUV projection lens has a high first order diffraction light efficiency and an optic system having the EUV projection lens has a high resolution.
申请公布号 US2011042587(A1) 申请公布日期 2011.02.24
申请号 US20100805003 申请日期 2010.07.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE DONG-GUN;KIM SEONG-SUE;SEO HWAN-SEOK
分类号 G21K5/10;G02B5/18;G02B13/14 主分类号 G21K5/10
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