OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

A plurality of air levitation units (50) that jet air to the lower surface of a substrate (P) are placed below the substrate (P), and the substrate (P) is supported in a noncontact manner so as to be substantially horizontal. Further, a portion subject to exposure of the substrate (P) is held by a fixed-point stage (40) from below in a noncontact manner, and the surface position of the portion subject to exposure is adjusted in a pinpoint manner. Accordingly, exposure can be performed on the substrate (P) with high precision, and a configuration of a substrate stage device (PST) can be simplified.