SEMICONDUCTOR APPARATUS OF FURNACE TYPE APPARATUS

摘要

PURPOSE: A semiconductor apparatus of a furnace type apparatus is provided to obtain a superior thin film having excellent chemical-physical property by generating plasma inside a reaction tube. CONSTITUTION: A boat(200) has a plurality of substrate mounted therein and is installed inside a reaction tube. A nozzle discharges a process gas to the plural substrate. A heater assembly is arranged the external circumference of the reaction tube and heats the reaction tube. The internal electrode is installed inside the boat. A high frequency power supply unit is connected to the internal electrode and supplies high frequency current to the internal electrode to generate plasma.