发明名称 APPARATUS FOR REMOVING RESIDUAL ETCHANT AND USE METHOD THEREOF
摘要 PURPOSE: An apparatus for removing residual etchant is provided to prevent uneven etching of the external side of glass by residue etchant sprayed from a nozzle and to avoid the accumulation of residue etchant in a supply tube or nozzle entrance. CONSTITUTION: An apparatus for removing residual etchant comprises: an upper supply pipe(3) for receiving etchant of constant pressure from the outside, which is arranged at the upper part of glass(1); a lower supply pipe(7) which is arranged at the lower part of glass and can receive the etchant of constant pressure from the outside; and a vertical supply tube(11) equipped with a nozzle(9) for spraying the etchant at the surrounding surface facing the glass.
申请公布号 KR20110018078(A) 申请公布日期 2011.02.23
申请号 KR20090075691 申请日期 2009.08.17
申请人 GLOBAL DISPLAY CO., LTD. 发明人 CHOI, SUN WOO;JIN, YOUNG TAE
分类号 C03C15/00 主分类号 C03C15/00
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