发明名称 |
APPARATUS FOR REMOVING RESIDUAL ETCHANT AND USE METHOD THEREOF |
摘要 |
PURPOSE: An apparatus for removing residual etchant is provided to prevent uneven etching of the external side of glass by residue etchant sprayed from a nozzle and to avoid the accumulation of residue etchant in a supply tube or nozzle entrance. CONSTITUTION: An apparatus for removing residual etchant comprises: an upper supply pipe(3) for receiving etchant of constant pressure from the outside, which is arranged at the upper part of glass(1); a lower supply pipe(7) which is arranged at the lower part of glass and can receive the etchant of constant pressure from the outside; and a vertical supply tube(11) equipped with a nozzle(9) for spraying the etchant at the surrounding surface facing the glass. |
申请公布号 |
KR20110018078(A) |
申请公布日期 |
2011.02.23 |
申请号 |
KR20090075691 |
申请日期 |
2009.08.17 |
申请人 |
GLOBAL DISPLAY CO., LTD. |
发明人 |
CHOI, SUN WOO;JIN, YOUNG TAE |
分类号 |
C03C15/00 |
主分类号 |
C03C15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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