BLANK MASK AND PHOTO MASK FABRICATED USING IT

摘要

PURPOSE: A method for manufacturing a blank mask of binary intensity is provided to ensure excellent pattern transfer accuracy and to reduce loading effect. CONSTITUTION: A method for manufacturing a blank mask(100) of binary intensity comprises: a step of preparing a transparent substrate(1); a step of forming a metal layer(7) on the transparent substrate; a step of forming a hard mask film on the metal layer; and a step of forming a resist film(6) on the hard mask film. The metal layer comprises a single layer or multilayer.