发明名称 RESIST INK AND METHOD FOR PRODUCING RESIST PATTERN
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a resist ink having excellent resist tendencies as well as printability to be used for obtaining optimum fine images desired for various electronic parts by etching, and to provide a method for forming a resist pattern using the ink. <P>SOLUTION: The resist ink contains: an alkaline soluble resin having an acid value of at least 150 (gKOH/g) and a weight average molecular weight of 500-5,000 and solid at 25°C; and an organic solvent having a vapor pressure of at most 0.02 kPa at 20°C and a swelling rate of a silicone blanket of 5-20%; wherein the viscosity at 25°C is 5-20 Pa s. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011032401(A) 申请公布日期 2011.02.17
申请号 JP20090181451 申请日期 2009.08.04
申请人 DIC CORP 发明人 SENTE YASUHIRO;YOSHIHARA SUNAO;KATAYAMA YOSHINORI
分类号 C09D11/00 主分类号 C09D11/00
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