| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask pair free from the occurrence of dust. <P>SOLUTION: The photomask pair includes a first photomask for use in a fist step and a second photomask for use in a second step subsequent to the first step, wherein a first monitor mark includes a monitor pattern 140 for monitoring element dimensions of a lower layer. The second photomask includes a light shielding pattern 14. When the first photomask is used in the first step and the second photomask is used in the second step, such a positional relation is set that the light shielding pattern 14 covers the pattern 140 for monitoring element dimensions. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
