| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device capable of forming uniform high-density plasma at low pressure over a large area. <P>SOLUTION: The device uses a cylindrical electrode as one in a plasma generating room opposed to a treatment substrate and arranges a magnetic field generating device at an atmosphere side for generating a point cusp magnetic field. Otherwise, one end of the cylindrical electrode is closed, and permanent magnets are arranged outside the closed site in a state of a ring so as directions of magnetic poles to be alternated and coaxial. <P>COPYRIGHT: (C)2011,JPO&INPIT |
