发明名称 CONTINUOUS SCANNING CRYSTALLIZATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent non-uniformity of irradiation of a laser beam accompanying a defect of irradiation control, damage by radiation of the laser beam outside a crystallization region and contamination due to generated fine particles when scanning irradiation by driving a substrate stage in crystallization using the continuous oscillation laser beam. SOLUTION: Irradiation control of the laser beam is performed by an optical path switching mechanism 4 arranged on an optical path. A margin part is installed outside the crystallization region where a substrate 20 is crystallized. An operation of the optical path switching mechanism 4 is performed by the margin part. Thus, non-uniformity of the irradiation of the laser beam due to the defect of irradiation control, the damage and contamination by irradiation of the laser beam to the outside of the crystallization region are suppressed. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011035043(A) 申请公布日期 2011.02.17
申请号 JP20090177644 申请日期 2009.07.30
申请人 SHIMADZU CORP 发明人 AKITA NORITAKA
分类号 H01L21/268;H01L21/20 主分类号 H01L21/268
代理机构 代理人
主权项
地址