发明名称 |
Immersion lithography apparatus and exposure method |
摘要 |
An immersion lithography apparatus includes: a projection optical system which projects a pattern of a mask onto a substrate; a substrate cleaning unit which cleans the substrate prior to projection of the pattern; a liquid supply mechanism which supplies the same liquid to an immersion region between the projection optical system and the substrate and to the substrate cleaning unit; a first liquid discharge path through which the liquid discharged from the immersion region is passed; and a second liquid discharge path through which the liquid discharged from the substrate cleaning unit is passed.
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申请公布号 |
US7889313(B2) |
申请公布日期 |
2011.02.15 |
申请号 |
US20070925483 |
申请日期 |
2007.10.26 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
KATANO MAKIKO;KONO TAKUYA;MIZUNO AYAKO |
分类号 |
G03B27/32;G03B27/42;G03B27/52;G03B27/58;G03D5/00 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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