发明名称 Fabricating a gallium nitride layer with diamond layers
摘要 In one aspect, a method includes fabricating a gallium nitride (GaN) layer with a first diamond layer having a first thermal conductivity and a second diamond layer having a second thermal conductivity greater than the first thermal conductivity. The fabricating includes using a microwave plasma chemical vapor deposition (CVD) process to deposit the second diamond layer onto the first diamond layer.
申请公布号 US7888171(B2) 申请公布日期 2011.02.15
申请号 US20080341191 申请日期 2008.12.22
申请人 RAYTHEON COMPANY 发明人 KORENSTEIN RALPH;BERNSTEIN STEVEN D.;PEREIRA STEPHEN J.
分类号 H01L21/00;H01L31/0312 主分类号 H01L21/00
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