发明名称 OVERLAY KEY PATTERN STRUCTURE AND METHOD OF CONTROLLING OVERLAY MATCHING
摘要 <p>PURPOSE: An overlay key pattern structure and a method of controlling overlay matching are provided to improve the productivity and reliability of a semiconductor chip by matching two layers formed at different times. CONSTITUTION: An overlay key(100) is formed within the scribe line(110) of a wafer. A first overlay key is formed with first bars(112,114,116,118). A second overlay key(122,124,126,128) is spaced from the first overlay key. The second overlay key is formed in the first overlay key of a rectangle bar. Third overlay keys(132,134,136,138) are spaced from the first overlay key and the second overlay key.</p>
申请公布号 KR20110014347(A) 申请公布日期 2011.02.11
申请号 KR20090071957 申请日期 2009.08.05
申请人 DONGBU HITEK CO., LTD. 发明人 KIM, MYUNG SOO
分类号 H01L21/027 主分类号 H01L21/027
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