| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask with which transmitted light quantity distribution can be finely controlled. <P>SOLUTION: The photomask has: a substrate; and a mask pattern layer which is formed on the substrate and has a microdot pattern not resolving in an exposure wavelength. The photomask controls the transmitted light quantity distribution at exposure based on the distribution state of the dot pattern, which are constituted using regular phase transmission, shading and antiphase transmission. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
