| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an EUV light source system that allows ready exchange of parts of an extreme ultraviolet (EUV) light source apparatus. <P>SOLUTION: The system includes (i) an extreme ultraviolet light source apparatus, including a chamber generating extreme ultraviolet light; a target supply unit supplying a target substance into the chamber; a driver laser irradiating the target substance supplied by the target supply unit with a laser beam to generate plasma; and a collector mirror collecting the extreme ultraviolet light irradiated from the plasma to allow the extreme ultraviolet light to make it enter a projection optical system of an exposure apparatus; and (ii) a lifting apparatus installed to lift and move an exchange part which is a part of the extreme ultraviolet light source apparatus. <P>COPYRIGHT: (C)2011,JPO&INPIT |
