LITHOGRAPHIC APPARATUS HAVING CONTAMINANT TRAPPING SYSTEM, CONTAMINANT TRAPPING SYSTEM, DEVICE MANUFACTURING METHOD, AND METHOD FOR TRAPPING OF CONTAMINANTS IN LITHOGRAPHIC APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a lithographic apparatus that has an illumination system including a contaminant trapping system with improved efficiency as compared with conventional contaminant trapping systems.

SOLUTION: The lithographic apparatus includes an illumination system for adjusting a radiation beam emitted substantially from a light emitting point LEP. The illumination system includes the contaminant trapping system CTS. The trapping system includes a contaminant trap CT having a central zone CZ and a peripheral zone PZ. The trap includes a plurality of platelets Pt that extend substantially outward through the peripheral zone. The light emitting point LEP exists on a plane where the platelets Pt overlap therewith. Each of the platelets Pt has a normal with respect to a component directed towards the central zone.

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