发明名称 ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS
摘要 <p>An inspection device is able, for example, to inspect reflectances of mirror elements of a spatial light modulator arranged in an optical path of an illumination optical system, on an as-needed basis. The inspection device (10) is configured to inspect a spatial light modulator having a plurality of optical elements arrayed two-dimensionally and controlled individually. The inspection device is provided with a conjugate optical system (11, 12) which is arranged optically downstream the spatial light modulator and which forms a conjugate plane optically conjugate with an array plane where the plurality of optical elements are arrayed; a photodetector (13) having a detection surface arranged on or near the conjugate plane; and an inspection unit (14) which inspects optical characteristics of the optical elements, based on the result of detection by the photodetector.</p>
申请公布号 EP2282188(A1) 申请公布日期 2011.02.09
申请号 EP20090754556 申请日期 2009.05.12
申请人 NIKON CORPORATION 发明人 TANITSU OSAMU;TANAKA HIROHISA
分类号 G01M11/00;G03F7/20;H01L21/027 主分类号 G01M11/00
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