| 摘要 |
PURPOSE: A chemical vapor deposition device, a guide member for a chemical vapor deposition device, and a thin film manufacturing method thereof are provided to properly control a gas discharge flow path by additionally inserting a guide member. CONSTITUTION: A reaction chamber is located inside a chamber and a discharge part is formed inside the chamber. A susceptor(500) is arranged in the reaction chamber and a substrate is loaded. A shower head(300) discharges process gas to the substrate. A guide member(620) guides the processing gas to the discharge part by forming the discharge flow path of the processing gas. The guide member comprises an outer circumference wall which is arranged between the outer circumference of the susceptor and the chamber. |
