发明名称 AN APPARATUS FOR CONTROL ANNEALING OF SEMICONDUCTORS AND A METHOD THEREOF
摘要 PURPOSE: Thermal processing apparatus and method for a semiconductor is provided to secure an optimized thermal processing condition regardless of the change of the condition by monitoring the state of a nitride based semiconductor in real time. CONSTITUTION: Laser light source(420) emits light. Optical fiber with a dual structure induces light emitted from a heat processing target according to incident light. One end of the optical fiber is a tip. Another end of the optical fiber with the dual structure is in connection with the laser light source and an optical detector(430). The optical detector detects the intensity of the induced light. A controller(440) monitors the intensity of light emitted to the optical detector. The controller controls a lamp to be stopped according to the light emitted to the optical detector.
申请公布号 KR20110011458(A) 申请公布日期 2011.02.08
申请号 KR20090069121 申请日期 2009.07.28
申请人 KOREA ELECTRONICS TECHNOLOGY INSTITUTE 发明人 SEO, YONG GON;HWANG, SUNG MIN;YOON, HYUNG DO;SUH, MOON SUHK;PARK, JAE HYOUN
分类号 H01L21/324 主分类号 H01L21/324
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