| 摘要 |
<P>PROBLEM TO BE SOLVED: To sequentially form patterns in a plurality of segmented regions of a sheet. <P>SOLUTION: When a segmented region SA<SB>i</SB>of a sheet S is scan-exposed, a stage SST<SB>1</SB>adsorbs, at a standby position at the +X end of a scan region AS, a backside part corresponding to the segmented region SA<SB>i</SB>of the sheet S onto a holding surface of a sheet holder SH<SB>1</SB>, and moves in the X axis direction (the -X direction) with a prescribed stroke in synchronization with a mask (a mask stage). At this point, the sheet S is irradiated with illumination beams corresponding to the parts of a pattern of the mask via projection optical systems. Thereby, the pattern is transferred (formed). After scan-exposure on the segmented region SA<SB>i</SB>, a stage SST<SB>2</SB>moves to a standby position within the XY plane. After the stage SST<SB>2</SB>adsorbs a backside part corresponding to the next segmented region SA<SB>i+1</SB>of the sheet S onto a holding surface of a sheet holder SH<SB>1</SB>, an exposure is performed by the scan-exposure method similarly to the above, to thereby form the pattern. <P>COPYRIGHT: (C)2011,JPO&INPIT |
