CHARGED PARTICLE BEAM IRRADIATING DEVICE, LITHOGRAPHY APPARATUS, ANALYZER MICROSCOPE, CHARGED PARTICLE BEAM EMITTER, AND LENS UNIT FOR CHARGED PARTICLE BEAM

摘要

PROBLEM TO BE SOLVED: To prevent the occurrence of spherical aberration on a lens to emit charged particle beam elements precisely onto an object. SOLUTION: A lithography apparatus includes an electron beam emitting unit which emits a plurality of electron beam elements from a plurality of two-dimensionally arranged emission sources, and an electron optics system which guides the electron beam elements to a board. The electron optics system has an electrostatic lens 41 which generates a potential rotationally symmetric with respect to an axis J1 parallel with an emission direction. When a pattern is drawn, a group of the electron beam elements emitted in ring shapes around the axis J1 are emitted sequentially as ring diameters are changed, and a field generated by the electrostatic lens 41 to act on the group of the electron beam elements is changed depending on each ring diameter so that the group of the electron beam elements pass through the same position on the axis J1 regardless of ring diameter variations. This prevents the occurrence of spherical aberration on the electrostatic lens 41, thus allows the electron beam elements to be emitted precisely onto the board. COPYRIGHT: (C)2011,JPO&INPIT