发明名称 LASER IRRADIATION METHOD AND LASER IRRADIATION APPARATUS
摘要 An object of the present invention is to provide a laser irradiation method and a laser irradiation apparatus for irradiating an irradiation surface with a linear beam having more homogeneous intensity by blocking a low-intensity part of the linear beam without forming the fringes due to the diffraction on the irradiation surface. In the laser irradiation, a laser beam emitted from a laser oscillator 101 passes through a slit 102 so as to block a low-intensity part of the laser beam, the traveling direction of the laser beam is bent by a mirror 103, and an image formed at the slit is projected to an irradiation surface 106 by a convex cylindrical lens 104.
申请公布号 US2011024406(A1) 申请公布日期 2011.02.03
申请号 US20100899983 申请日期 2010.10.07
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 TANAKA KOICHIRO;YAMAMOTO YOSHIAKI
分类号 B23K26/06;B23K26/00;B23K26/073;H01L21/20;H01L21/268;H01L21/336;H01L21/77;H01L21/84;H01L29/786 主分类号 B23K26/06
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