| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus capable of stably performing vacuum processing by enabling an electrostatic chuck having decreased in attracting power owing to impurity sticking on an attraction surface, to have its original attracting power again by removing the impurity with simple constitution. SOLUTION: The vacuum processing apparatus 1 includes at least a vacuum chamber 3, an substrate holding means 4 arranged in the vacuum chamber 3 and having an electrode for the electrostatic chuck configured to electrostatically attract a substrate S and a heating mechanism configured to heat the substrate, and a UV irradiation means 90 of irradiating the attraction surface of the substrate holding means with UV light to remove the impurity sticking on the attraction surface. COPYRIGHT: (C)2011,JPO&INPIT |
