PRETREATMENT METHOD USING A SPUTTERING SYSTEM, AND PRETREATMENT APPARATUS USED IN A ROLL-TO-ROLL SPUTTERING APPARATUS

摘要

According to the present invention, a pretreatment method using a sputtering system comprises: a step of applying radiofrequency (RF) power to a guide roller having an electrode; a step of injecting gas into a housing; a step of ionizing the injected gas into a plasma state by means of the RF power; and a step of enabling the ionized gas to collide against a flexible film wound on the guide roller and to absorb and remove foreign substances from the surface of the flexible film. The pretreatment method using a sputtering system according to the present invention achieves excellent pretreatment efficiency, reduces the loss of the surface of the film caused by plasma, and improves the adhesion properties of a thin film during a thin film deposition process performed after a pretreatment process.