| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve calibration of a lot of alignment heads, and to improve overlay accuracy and a product yield. <P>SOLUTION: A lithographic apparatus is provided with an apparatus for measuring the alignment of an object. The lithographic apparatus is further provided with: a plurality of alignment sensors, each including an alignment detector for measuring the position of an alignment mark over an alignment detection area; a leveling sensor for measuring the height and/or tilt of an object in a leveling sensor detection area; and a feed-forward connection part between the leveling sensor and the alignment sensors. <P>COPYRIGHT: (C)2011,JPO&INPIT |
